Home > Techniques and equipment > SEM & FIB microscopies > Zeiss Leo 1450VP
This scanning electron microscope is mainly used for routine imaging and analysis. The electron source used is a tungsten filament in a Wehnelt cylinder to focus and control the electron beam.
Resolution |
3.5 nm at 30 kV at optimum working distance |
Acceleration voltage |
0.2kV to 30 kV |
Probe current |
10 pA to 1000 nA |
Magnification |
X9 to x 900,000 compared with a Polaroid reference |
Working distance |
from 0.1 mm to 50 mm |
Chamber dimensions |
300 mm x 270 mm x 224 mm (H) |
Platinum stage (5 axes) |
X/Y = 100/125 mm Z = 60 mm (35 mm motorized) T = 0° to +90 360° continuous rotation |
Variable pressure |
1Pa to 400 Pa |
Maximum sample weight |
500 g |
The Leo 1450VP features three imaging detectors:
Detector name |
SE1 |
BSE |
VPSE |
Electron type |
Secondary |
Backscattered |
Secondary |
Special features |
Suitable for low magnification; Not suitable for low WD; |
Features gain adjustment in addition to brightness and contrast; Often requires a higher current and/or lower sweep speed than the other two. |
Suitable for insulating, vacuum-sensitive or hydrated samples |
The Leo 1450VP features an EDX (Energy Dispersive X-ray) probe with the following characteristics:
Crystal Silicon Drift 80 mm² nominal active surface;
SATW light element window for detection of elements from beryllium to uranium.
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