Technical specifications

This scanning electron microscope is mainly used for routine imaging and analysis. The electron source used is a tungsten filament in a Wehnelt cylinder to focus and control the electron beam.

Resolution

3.5 nm at 30 kV at optimum working distance

Acceleration voltage

0.2kV to 30 kV

Probe current

10 pA to 1000 nA

Magnification

X9 to x 900,000 compared with a Polaroid reference

Working distance

from 0.1 mm to 50 mm

Chamber dimensions

300 mm x 270 mm x 224 mm (H)

Platinum stage (5 axes)

X/Y = 100/125 mm

Z = 60 mm (35 mm motorized)

T = 0° to +90

360° continuous rotation

Variable pressure

1Pa to 400 Pa

Maximum sample weight

500 g

The Leo 1450VP features three imaging detectors:

Detector name

SE1

BSE

VPSE

Electron type

Secondary

Backscattered

Secondary

Special features

Suitable for low magnification;

Not suitable for low WD;
Not very sensitive to surface carbon pollution

Features gain adjustment in addition to brightness and contrast;

Often requires a higher current and/or lower sweep speed than the other two.

Suitable for insulating, vacuum-sensitive or hydrated samples

The Leo 1450VP features an EDX (Energy Dispersive X-ray) probe with the following characteristics:

  • Crystal Silicon Drift 80 mm² nominal active surface;

  • SATW light element window for detection of elements from beryllium to uranium.

Other SEM & FIB instruments

Zeiss Crossbeam 550L SEM-FIB

JEOL JSM 7600F FEG-SEM

JEOL JSM 5800LV SEM

Zeiss Merlin FEG-SEM

Keyence VHX 2000 digital microscope

Zeiss Axio Imager optical microscope

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