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X-ray diffraction (XRD) is a technique based on the phenomenon of elastic scattering of X-rays by crystallized matter.
It provides access to a wealth of information, both structural(arrangement of atoms within a material) and microstructural(size, orientation and microdeformations of crystallites).
Samples can be powders, polycrystalline bulk samples, thin films or single crystals. The applications vary depending on the type of sample.
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Single-crystal X-ray diffraction can be used to determine the atomic structure of crystallized solids with great precision, provided the quality of the sample allows it. A wealth of structural information can be deduced to interpret and predict physico-chemical properties at both molecular and extended scales.
For example, single-crystal XRD has led to the discovery, by members of the Institut des Matériaux de Nantes Jean Rouxel, of a new family of lead halide-based hybrid materials with great potential for applications in light-emitting diodes.
Structure of the two low-dimensional compounds (BAPP)Pb2Br8 (BAPP = 1,4-bis(3-aminopropyl)piperazine) and (TDMP)PbBr4 (TDMP = trans-2,5-dimethylpiperazine) determined from single-crystal X-ray diffraction data. In (TDMP)PbBr4 (right), all potential color centers (Pb23+, Pb22+Pb3+, X2–, or X2-; X = halogens) are possible due to the short Pb-Pb distance and the cis-terminal anion X.
X-ray powder diffraction gives access not only to atomic structure but also to microstructure. Determining the structure of a totally new compound is possible, even from a powder diffraction diagram subject to numerous overlaps of diffraction peaks, leading to a high degree of ambiguity in determining their characteristics.
The adjacent figure shows ab initio powder structural resolution and Rietveld refinement from diffraction data of a new lanthanide-free alkali polyoxometalate with water-responsive turn-off–turn-on luminescence properties.
X-ray diffraction on thin films enables us to identify their crystalline or non-crystalline nature, and to characterize the resulting structure and microstructure.
Thin films of TiO2a photocatalytic material, were able to be deposited at low temperatures by plasma-enhanced chemical vapour deposition (PECVD),in continuous mode (CW) and pulsed plasma discharge (PD), then analyzed according to their thickness, which was found to have a significant impact on their photocatalytic activity.
(a) X-ray diffraction pattern of thin films deposited by PECVD in continuous (CW, top) and pulsed (PD, bottom) modes. The pattern expected from a randomly oriented sample is represented above by orange bars. (b) Integrated and (c) Lotgering factors of crystallographic planes (101): squares, (112): circles, (200): crosses and (211): triangles in CW (black) and pulsed (red) plasma as a function of film thickness.
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